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	ENVOSYS CENTROTHERM CLEAN SOLUTIONS GMBH 1711103 16 Jan 2015	REGISTERED on 28 Jun 2019	Installations for processing semiconductors, in particular for process... Class 001 Class 001 Chemical Products Installations for processing semiconductors, in particular for processing semiconductors under vacuum, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon; installations for conveying semiconductors, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon; Installations and systems for the surface treatment of semiconductors comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps; installations and systems for etching semiconductor surfaces; installations for vaporizing semiconductor surfaces, in particular under vacuum (CVD processes), namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon; installations for conveying, providing and processing semiconductors, namely, machines with automatically mount semiconductors on printed circuit boards, semiconductor manufacturing machines, semiconductor wafer processing machines, installations for conveying and processing and providing photoelectric elements comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps, installations for conveying, processing, and providing flat screens, namely, diamond saws, polishing machines, bevelling machines, automated solder paste dispenser; hardware and software for controlling the operation of systems and installations for the thermal treatment of surfaces and objects, or for thermal processes for modifying surfaces, in particular semiconductor surfaces, namely diffusion furnaces, continuous furnaces, installations for vaporizing semiconductor surfaces, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for conveying semiconductors, namely, high-temperature furnaces, wafer process systems. low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for vaporizing semiconductor surfaces, in particular under vacuum (CVD processes), namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, stove furnaces, vacuum furnaces; hardware and software for controlling the operation of systems and installations for cleaning gases and exhaust gases, including exhaust gas-purifying installations, namely, installations for processing semiconductors, in particular for processing semiconductors under vacuum, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for conveying semiconductors, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations and systems for the surface treatment of semiconductors comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps, installations and systems for etching semiconductor surfaces, installations for vaporizing semiconductor surfaces, in particular under vacuum (CVD processes), namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for conveying, providing and processing semiconductors, namely, machines with automatically mount semiconductors on printed circuit boards, semiconductor manufacturing machines, semiconductor wafer processing machines, installations for conveying and processing and providing photoelectric elements comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps, installations for conveying, processing. and providing flat screens, namely, diamond saws, polishing machines, bevelling machines, automated solder paste dispensers, systems and installations for thermal pretreatment processes or manufacturing processes, namely diffusion furnaces, continuous furnaces, coating furnaces, stove furnaces, vacuum furnaces, installations for steam separation on surfaces, in particular under vacuum conditions (CVD processes), namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying epitaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries, installations for processing and cleaning gases and exhaust gases, namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying eptaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries, purification installations for sewage, namely, mineral filtering materials for the sewage treatment industry, sewage filtering units for industrial use; systems and installations for thermal pretreatment processes or manufacturing processes, namely diffusion furnaces, continuous furnaces, coating furnaces, stove furnaces, vacuum furnaces; installations for steam separation on surfaces, in particular under vacuum conditions (CVD processes), namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying epitaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries; installations for processing and cleaning gases and exhaust gases, namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying epitaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries; devices for releasing exhaust gases into the environment, namely, devices for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, dry bed absorbers for waste gas removal for use in the photovoltaic and semiconductor industries; gas flares; sewage purification plants; purification installations for sewage, namely, mineral filtering materials for the sewage treatment industry, sewage filtering units for industrial use; sewage disposal plants. Class 006 Class 006 Metal Products ... Class 007 Machinery Products Class 009 Computer & Software Products & Electrical & Scientific Products Class 011 Environmental Control Instrument Products lighting heating cooling cooking

REGISTERED

on 28 Jun 2019

ENVOSYS

CENTROTHERM CLEAN SOLUTIONS GMBH

1711103 · 16 Jan 2015

001

Class 001

Chemical Products

Installations for processing semiconductors, in particular for processing semiconductors under vacuum, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon; installations for conveying semiconductors, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon; Installations and systems for the surface treatment of semiconductors comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps; installations and systems for etching semiconductor surfaces; installations for vaporizing semiconductor surfaces, in particular under vacuum (CVD processes), namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon; installations for conveying, providing and processing semiconductors, namely, machines with automatically mount semiconductors on printed circuit boards, semiconductor manufacturing machines, semiconductor wafer processing machines, installations for conveying and processing and providing photoelectric elements comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps, installations for conveying, processing, and providing flat screens, namely, diamond saws, polishing machines, bevelling machines, automated solder paste dispenser; hardware and software for controlling the operation of systems and installations for the thermal treatment of surfaces and objects, or for thermal processes for modifying surfaces, in particular semiconductor surfaces, namely diffusion furnaces, continuous furnaces, installations for vaporizing semiconductor surfaces, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for conveying semiconductors, namely, high-temperature furnaces, wafer process systems. low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for vaporizing semiconductor surfaces, in particular under vacuum (CVD processes), namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, stove furnaces, vacuum furnaces; hardware and software for controlling the operation of systems and installations for cleaning gases and exhaust gases, including exhaust gas-purifying installations, namely, installations for processing semiconductors, in particular for processing semiconductors under vacuum, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for conveying semiconductors, namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations and systems for the surface treatment of semiconductors comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps, installations and systems for etching semiconductor surfaces, installations for vaporizing semiconductor surfaces, in particular under vacuum (CVD processes), namely, high-temperature furnaces, wafer process systems, low temperature microwave plasma oxidation equipment, and equipment for compound semiconductor and silicon, installations for conveying, providing and processing semiconductors, namely, machines with automatically mount semiconductors on printed circuit boards, semiconductor manufacturing machines, semiconductor wafer processing machines, installations for conveying and processing and providing photoelectric elements comprised of furnaces, semiconductor loading stations, semiconductor handling systems, front-end and back-end furnaces in production lines, branching pipes of metal, pneumatic pumps, installations for conveying, processing. and providing flat screens, namely, diamond saws, polishing machines, bevelling machines, automated solder paste dispensers, systems and installations for thermal pretreatment processes or manufacturing processes, namely diffusion furnaces, continuous furnaces, coating furnaces, stove furnaces, vacuum furnaces, installations for steam separation on surfaces, in particular under vacuum conditions (CVD processes), namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying epitaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries, installations for processing and cleaning gases and exhaust gases, namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying eptaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries, purification installations for sewage, namely, mineral filtering materials for the sewage treatment industry, sewage filtering units for industrial use; systems and installations for thermal pretreatment processes or manufacturing processes, namely diffusion furnaces, continuous furnaces, coating furnaces, stove furnaces, vacuum furnaces; installations for steam separation on surfaces, in particular under vacuum conditions (CVD processes), namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying epitaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries; installations for processing and cleaning gases and exhaust gases, namely, installations for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, installations for applying epitaxy to semiconductors, installations for removing waste-gas from epitaxial applications for the photovoltaic and semiconductor industries, installations comprised of dry bed absorber for waste gas removal for use in the photovoltaic and semiconductor industries, installations comprised of exhaust air condensers for treating solvent containing air for use in the photovoltaic and semiconductor industries, installations composed of wet scrubbers for the treatment of waste gases from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, particle filters for waste gas treatment for use in the photovoltaic and semiconductor industries; devices for releasing exhaust gases into the environment, namely, devices for removing waste-gas from chemical vapor desposition and etching processes for the photovoltaic and semiconductor industries, dry bed absorbers for waste gas removal for use in the photovoltaic and semiconductor industries; gas flares; sewage purification plants; purification installations for sewage, namely, mineral filtering materials for the sewage treatment industry, sewage filtering units for industrial use; sewage disposal plants.

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